Entegris, Inc.
Method for selectively removing nickel platinum material
Last updated:
Abstract:
A method of selectively removing NiPt material from a microelectronic substrate, the method comprising contacting the NiPt material with an aqueous etching composition comprising: an oxidising agent; a strong acid; and a source of chloride.
Status:
Grant
Type:
Utility
Filling date:
18 Jun 2019
Issue date:
13 Sep 2022