Entegris, Inc.
Method for selectively removing nickel platinum material

Last updated:

Abstract:

A method of selectively removing NiPt material from a microelectronic substrate, the method comprising contacting the NiPt material with an aqueous etching composition comprising: an oxidising agent; a strong acid; and a source of chloride.

Status:
Grant
Type:

Utility

Filling date:

18 Jun 2019

Issue date:

13 Sep 2022