Entegris, Inc.
METHODS FOR DEPOSITING A TUNGSTEN OR MOLYBDENUM LAYER IN THE PRESENCE OF A REDUCING CO-REACTANT

Abstract:

Described are vapor deposition methods for depositing metal films or layers onto a substrate, e.g., wherein the metal is molybdenum or tungsten; the methods involve vapor deposition of a metal layer onto a substrate from a metal-containing precursor in the presence of reducing gas (e.g., hydrogen) and a nitrogen-containing reducing compound.