Entegris, Inc.
CONDITIONER FOR CHEMICAL-MECHANICAL-PLANARIZATION PAD AND RELATED METHODS
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Abstract:
Described are abrasive surfaces and pad conditioners that contain high precision shaped surfaces, including pad conditioners useful for conditioning a chemical-mechanical processing (CMP) pad, and related methods.
Status:
Application
Type:
Utility
Filling date:
3 May 2019
Issue date:
21 Nov 2019