Ferro Corporation
Slurry Composition And Method Of Selective Silica Polishing
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Abstract:
An acidic slurry composition for use in chemical-mechanical polishing including an acid pH adjuster and a cationic polishing suppressant comprising a quaternized aromatic heterocycle. The quaternized aromatic heterocycle imparts a polishing selectivity of silica over crystalline silicon of at least 100.
Status:
Application
Type:
Utility
Filling date:
2 Aug 2017
Issue date:
12 Mar 2020