Ferro Corporation
Slurry composition and method of selective silica polishing

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Abstract:

An acidic slurry composition for use in chemical-mechanical polishing including an acid pH adjuster and a cationic polishing suppressant comprising a quaternized aromatic heterocycle. The quaternized aromatic heterocycle imparts a polishing selectivity of silica over crystalline silicon of at least 100.

Status:
Grant
Type:

Utility

Filling date:

2 Aug 2017

Issue date:

7 Dec 2021