Ferro Corporation
Slurry composition and method of selective silica polishing
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Abstract:
An acidic slurry composition for use in chemical-mechanical polishing including an acid pH adjuster and a cationic polishing suppressant comprising a quaternized aromatic heterocycle. The quaternized aromatic heterocycle imparts a polishing selectivity of silica over crystalline silicon of at least 100.
Status:
Grant
Type:
Utility
Filling date:
2 Aug 2017
Issue date:
7 Dec 2021