Corning Incorporated
METHODS FOR FORMING PATTERNED INSULATING LAYERS ON CONDUCTIVE LAYERS AND DEVICES MANUFACTURED USING SUCH METHODS

Abstract:

A method for forming a patterned insulating layer on a conductive layer can include severing a mask disposed on the conductive layer using photochemical ablation along a perimeter of a central region of the mask. The central region of the mask can be removed to form an opening in the mask, whereby a remaining region of the mask surrounding the opening in the mask covers a corresponding surrounding region of the conductive layer. An insulating layer can be applied to the central region of the conductive layer and the remaining region of the mask. The remaining region of the mask can be removed from the conductive layer to remove an excess portion of the insulating layer disposed on the remaining region of the mask, whereby a remaining portion of the insulating layer corresponding to the opening in the mask defines the patterned insulating layer disposed on the conductive layer.