Corning Incorporated
METHOD OF FORMING THROUGH HOLE IN GLASS

Abstract:

A method of forming a through hole in a glass substrate is provided. The method includes irradiating a surface of a glass substrate with a mid-infrared or far-infrared laser to form a pilot hole including a plurality of cracks extending radially outward from the pilot hole. The pilot hole is etched to expand a diameter of the pilot hole to at least encompass the plurality of cracks to form a through hole having a through hole entry diameter of about 200 micrometers to about 1.5 millimeters.