Corning Incorporated
METHOD OF TREATING GLASS SUBSTRATE SURFACES

Abstract:

Manufacturing method of the glass substrate suitable for flat panel display having upper and lower major surfaces. While the glass substrate is conveyed, the lower surface is treated by two continuous process steps; i) contact with dry HF gas, where the dry HF gas can be generated by atmospheric pressure plasma enhancement, and ii) contact with wet aqueous solution including HF, to achieve average surface roughness determined by AFM to be in a range of 0.5 to 1.5 nm.