Honeywell International Inc.
Through silicon via fabrication

Last updated:

Abstract:

One or more embodiments are directed to establishing electrical connections through silicon wafers with low resistance and high density, while at the same time maintaining processability for further fabrication. Such connections through silicon wafers enable low resistance connections from the top side of a silicon wafer to the bottom side of the silicon wafer.

Status:
Grant
Type:

Utility

Filling date:

13 May 2019

Issue date:

15 Dec 2020