Honeywell International Inc.
THROUGH SILICON VIA FABRICATION
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Abstract:
One or more embodiments are directed to establishing electrical connections through silicon wafers with low resistance and high density, while at the same time maintaining processability for further fabrication. Such connections through silicon wafers enable low resistance connections from the top side of a silicon wafer to the bottom side of the silicon wafer.
Status:
Application
Type:
Utility
Filling date:
13 May 2019
Issue date:
19 Nov 2020