International Business Machines Corporation
Double replacement metal line patterning

Abstract:

Integrated chips and methods of forming the same include forming lines of alternating first and second sacrificial fills in a film. A dielectric cut is formed in at least one of the first sacrificial fills. A dielectric cut is formed in at least one of the second sacrificial fills. Remaining first and second sacrificial fill material is replaced with a conductive material. The film is replaced with a final dielectric material.