International Business Machines Corporation
Multilayer pillar for reduced stress interconnect and method of making same

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Abstract:

A multi-layer pillar and method of fabricating the same is provided. The multi-layer pillar is used as an interconnect between a chip and substrate. The pillar has at least one low strength, high ductility deformation region configured to absorb force imposed during chip assembly and thermal excursions.

Status:
Grant
Type:

Utility

Filling date:

3 Jul 2019

Issue date:

17 Aug 2021