International Business Machines Corporation
Staircase surface-enhanced raman scattering substrate

Abstract:

A method for fabricating a surface enhancement of Raman scattering substrate is disclosed. The method further includes patterning a hardmask on a portion of a substrate. The method further includes directionally etching a portion of an exposed portion of the substrate to form a first stepped portion. The method further includes trimming the hardmask laterally to a first predetermined width. The method further includes directionally etching a portion of exposed horizontal portions of the substrate to form a second stepped portion.