International Business Machines Corporation
BARRIER REMOVAL FOR CONDUCTOR IN TOP VIA INTEGRATION SCHEME
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Abstract:
A multi-layer device comprising a barrier or adhesion layer located on a portion of a first top surface of a first layer, a conductive metal layer located on barrier or adhesion layer; and a dielectric layer located on top of the first layer, wherein the dielectric layer is in direct contact with the sidewall of the conductive metal layer.
Status:
Application
Type:
Utility
Filling date:
14 Feb 2020
Issue date:
19 Aug 2021