International Business Machines Corporation
BARRIER REMOVAL FOR CONDUCTOR IN TOP VIA INTEGRATION SCHEME

Last updated:

Abstract:

A multi-layer device comprising a barrier or adhesion layer located on a portion of a first top surface of a first layer, a conductive metal layer located on barrier or adhesion layer; and a dielectric layer located on top of the first layer, wherein the dielectric layer is in direct contact with the sidewall of the conductive metal layer.

Status:
Application
Type:

Utility

Filling date:

14 Feb 2020

Issue date:

19 Aug 2021