International Business Machines Corporation
DIRECT GROWTH OF LATERAL III-V BIPOLAR TRANSISTOR ON SILICON SUBSTRATE

Last updated:

Abstract:

A lateral bipolar junction transistor including an emitter region, base region and collector region laterally orientated over a type IV semiconductor substrate, each of the emitter region, the base region and the collector region being composed of a type III-V semiconductor material. A buried oxide layer is present between the type IV semiconductor substrate and the emitter region, the base region and the collector region. The buried oxide layer having a pedestal aligned with the base region.

Status:
Application
Type:

Utility

Filling date:

26 Feb 2021

Issue date:

12 Aug 2021