International Business Machines Corporation
Double magnetic tunnel junction device, formed by UVH wafer bonding

Last updated:

Abstract:

A method of manufacturing a double magnetic tunnel junction device is provided. The method includes forming a first magnetic tunnel junction stack. The first magnetic tunnel junction stack includes a first reference layer. The method also includes forming a second magnetic tunnel junction stack, where the second magnetic tunnel junction stack includes a second reference layer. The method also includes bonding the first magnetic tunnel junction stack to the second magnetic tunnel junction stack with ultra-high vacuum bonding to form the double magnetic tunnel junction device.

Status:
Grant
Type:

Utility

Filling date:

22 Nov 2019

Issue date:

7 Sep 2021