International Business Machines Corporation
Double magnetic tunnel junction device, formed by UVH wafer bonding
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Abstract:
A method of manufacturing a double magnetic tunnel junction device is provided. The method includes forming a first magnetic tunnel junction stack. The first magnetic tunnel junction stack includes a first reference layer. The method also includes forming a second magnetic tunnel junction stack, where the second magnetic tunnel junction stack includes a second reference layer. The method also includes bonding the first magnetic tunnel junction stack to the second magnetic tunnel junction stack with ultra-high vacuum bonding to form the double magnetic tunnel junction device.
Status:
Grant
Type:
Utility
Filling date:
22 Nov 2019
Issue date:
7 Sep 2021