International Business Machines Corporation
ON INTEGRATED CIRCUIT (IC) DEVICE CAPACITOR BETWEEN METAL LINES

Abstract:

An IC device includes capacitor elements formed within the same wiring level and in an area of the wiring level that is between a pair of wiring lines. This area may be an area that is not previously utilized, may be an area where dummy metal features were traditionally utilized, or the like. In a first implementation, the capacitor elements include a first capacitor comb interleaved with a second capacitor comb. In another implementation, the capacitor element is a perforated capacitor plate. The geometry of the interleaved capacitor combs and the open area of the perforations may be tuned in order to achieve or meet a predetermined uniform wiring level metal density requirement(s). The IC device may utilize a capacitor formed at least in part with the capacitor elements as a decoupling capacitor, a noise filter, a sensor, or the like.