International Business Machines Corporation
VTFET WITH CELL HEIGHT CONSTRAINTS

Last updated:

Abstract:

Semiconductor devices include a channel fin having a top surface. A top semiconductor structure, in contact with the entire top surface of the channel fin and having a top portion and a bottom portion, with the top portion of the top semiconductor structure being narrower than the bottom portion. A restraint structure being formed over the bottom portion of the semiconductor structure.

Status:
Application
Type:

Utility

Filling date:

2 Sep 2021

Issue date:

23 Dec 2021