International Business Machines Corporation
Artificial neural networks (ANN) including a resistive element based on doped semiconductor elements
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Abstract:
A resistive element in an artificial neural network, the resistive element includes a Silicon-on-insulator (SOI) substrate, and a Silicon layer formed on the Silicon-on-insulator substrate. The Silicon layer includes dopants derived from a thin film dopant layer, and the thin film dopant layer includes a programmed amount of dopant including at least one of Boron and Phosphorus.
Status:
Grant
Type:
Utility
Filling date:
28 Feb 2019
Issue date:
18 Jan 2022