International Business Machines Corporation
Artificial neural networks (ANN) including a resistive element based on doped semiconductor elements

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Abstract:

A resistive element in an artificial neural network, the resistive element includes a Silicon-on-insulator (SOI) substrate, and a Silicon layer formed on the Silicon-on-insulator substrate. The Silicon layer includes dopants derived from a thin film dopant layer, and the thin film dopant layer includes a programmed amount of dopant including at least one of Boron and Phosphorus.

Status:
Grant
Type:

Utility

Filling date:

28 Feb 2019

Issue date:

18 Jan 2022