International Business Machines Corporation
Gate-all-around field effect transistor having multiple threshold voltages

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Abstract:

One example of an apparatus includes a conducting channel region. The conducting channel region includes a plurality of epitaxially grown, in situ doped conducting channels arranged in a spaced apart relation relative to each other. A source positioned at a first end of the conducting channel region, and a drain positioned at a second end of the conducting channel region. A gate surrounds all sides of the conducting channel region and fills in spaces between the plurality of epitaxially grown, in situ doped conducting channels.

Status:
Grant
Type:

Utility

Filling date:

16 Jan 2020

Issue date:

8 Feb 2022