Intel Corporation
SOURCE/DRAIN REGIONS IN INTEGRATED CIRCUIT STRUCTURES

Abstract:

Disclosed herein are source/drain regions in integrated circuit (IC) structures, as well as related methods and components. For example, in some embodiments, an IC structure may include: a channel region including a semiconductor material; and a source/drain region at a side face of the channel region, wherein the source/drain region includes a semiconductor portion and a contact metal, and the semiconductor portion is between the contact metal and the semiconductor material.