Intel Corporation
AIRGAP STRUCTURES FOR HIGH SPEED SIGNAL INTEGRITY

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Abstract:

Processes and structures resulting therefrom for the improvement of high speed signaling integrity in electronic substrates of integrated circuit packages, which is achieved with the formation of airgap structures within dielectric material(s) between adjacent conductive routes that transmit/receive electrical signals, wherein the airgap structures decrease the capacitance and/or decrease the insertion losses in the dielectric material used to form the electronic substrates.

Status:
Application
Type:

Utility

Filling date:

27 May 2020

Issue date:

2 Dec 2021