Intel Corporation
ELECTROLESS PLATING PROCESS
Last updated:
Abstract:
The present disclosure is directed to an electroless plating process using a panel basket for holding semiconductor panels comprising a plurality of metal pads and shielding the metal pads from contaminants and over-etching and under-etching caused by the contaminants.
Status:
Application
Type:
Utility
Filling date:
23 Sep 2021
Issue date:
13 Jan 2022