Intel Corporation
ELECTROLESS PLATING PROCESS

Last updated:

Abstract:

The present disclosure is directed to an electroless plating process using a panel basket for holding semiconductor panels comprising a plurality of metal pads and shielding the metal pads from contaminants and over-etching and under-etching caused by the contaminants.

Status:
Application
Type:

Utility

Filling date:

23 Sep 2021

Issue date:

13 Jan 2022