Intel Corporation
DOUBLE WALL CAPACITORS AND METHODS OF FABRICATION

Abstract:

An integrated circuit capacitor array includes a plurality of first electrodes, wherein individual ones of the first electrodes are substantially cylindrical with a base over a substrate and an open top end over the base. A first dielectric material layer spans a distance between the first electrodes but is absent from an interior of the first electrodes, where the first dielectric material layer is substantially planar and bifurcates a height of first electrodes. A second dielectric material layer lines the interior of the first electrodes, and lines portions of an exterior of the first electrodes above and below the first dielectric material layer and a second electrode is within the interior of the first electrodes and is around the exterior of the first electrodes above and below the first dielectric material layer.