Intel Corporation
Thin film transistor with selectively doped oxide thin film

Abstract:

A thin film transistor (TFT) device is provided, where the TFT may include a source and a drain, a gate stack, and a semiconductor body. The gate stack may include a gate dielectric structure and a gate electrode, and the gate stack may be between the source and the drain. A first section of the semiconductor body may be adjacent to at least a section of the gate stack. A spacer may be between the gate stack and the source, where the spacer may be on the semiconductor body, and where a second section of the semiconductor body underneath the spacer may comprise dopants.