Intel Corporation
Floating body metal-oxide-semiconductor field-effect-transistors (MOSFET) as antifuse elements

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Abstract:

Embodiments herein may describe techniques for an integrated circuit including a MOSFET having a semiconductor well, a source area and a drain area next to the semiconductor well, a gate electrode, and a base terminal. The gate electrode may be coupled to the base terminal, hence forming a floating body MOSFET. A junction may exist between the drain area and the semiconductor well. A first resistance may exist between the source area and the drain area through the semiconductor well. A programming operation may be performed when the gate electrode is coupled to a high impedance, a programming voltage is applied at the source area, and the drain area is coupled to a ground voltage to break the junction between the drain area and the semiconductor well to generate a current between the source area, the semiconductor well, and the drain area. Other embodiments may be described and/or claimed.

Status:
Grant
Type:

Utility

Filling date:

2 Apr 2018

Issue date:

15 Mar 2022