Intel Corporation
DUAL SELF-ALIGNED GATE ENDCAP (SAGE) ARCHITECTURES
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Abstract:
Dual self-aligned gate endcap (SAGE) architectures, and methods of fabricating dual self-aligned gate endcap (SAGE) architectures, are described. In an example, an integrated circuit structure includes a first semiconductor fin having a cut along a length of the first semiconductor fin. A second semiconductor fin is parallel with the first semiconductor fin. A first gate endcap isolation structure is between the first semiconductor fin and the second semiconductor fin. A second gate endcap isolation structure is in a location of the cut along the length of the first semiconductor fin.
Status:
Application
Type:
Utility
Filling date:
15 Nov 2021
Issue date:
10 Mar 2022