Intel Corporation
Stacked transistors with Si PMOS and high mobility thin film transistor NMOS

Last updated:

Abstract:

An integrated circuit structure comprises a lower device layer that includes a first structure comprising a plurality of PMOS transistors. An upper device layer is formed on the lower device layer, wherein the upper device layer includes a second structure comprising a plurality of NMOS thin-film transistors (TFT).

Status:
Grant
Type:

Utility

Filling date:

28 Mar 2018

Issue date:

19 Jul 2022