Intel Corporation
Stacked transistors with Si PMOS and high mobility thin film transistor NMOS
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Abstract:
An integrated circuit structure comprises a lower device layer that includes a first structure comprising a plurality of PMOS transistors. An upper device layer is formed on the lower device layer, wherein the upper device layer includes a second structure comprising a plurality of NMOS thin-film transistors (TFT).
Status:
Grant
Type:
Utility
Filling date:
28 Mar 2018
Issue date:
19 Jul 2022