Intel Corporation
Approaches for embedding spin hall MTJ devices into a logic processor and the resulting structures

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Abstract:

Approaches for embedding spin hall MTJ devices into a logic processor, and the resulting structures, are described. In an example, a logic processor includes a logic region including fin-FET transistors disposed in a dielectric layer disposed above a substrate. The logic processor also includes a memory array including a plurality of two-transistor one magnetic tunnel junction (MTJ) spin hall electrode (2T1MTJ SHE) bit cells. The transistors of the 2T1MTJ SHE bit cells are fin-FET transistors disposed in the dielectric layer.

Status:
Grant
Type:

Utility

Filling date:

7 Mar 2016

Issue date:

19 Jul 2022