Intel Corporation
Formation of tall metal pillars using multiple photoresist layers

Last updated:

Abstract:

An apparatus system is provided which comprises: a substrate; a metal pillar formed on the substrate, the metal pillar comprising a first section and a second section, wherein the first section of the metal pillar is formed by depositing metal in a first opening of a first photoresist layer, and wherein the second section of the metal pillar is formed by depositing metal in a second opening of a second photoresist layer.

Status:
Grant
Type:

Utility

Filling date:

30 Mar 2017

Issue date:

19 Jul 2022