Intel Corporation
Formation of tall metal pillars using multiple photoresist layers
Last updated:
Abstract:
An apparatus system is provided which comprises: a substrate; a metal pillar formed on the substrate, the metal pillar comprising a first section and a second section, wherein the first section of the metal pillar is formed by depositing metal in a first opening of a first photoresist layer, and wherein the second section of the metal pillar is formed by depositing metal in a second opening of a second photoresist layer.
Status:
Grant
Type:
Utility
Filling date:
30 Mar 2017
Issue date:
19 Jul 2022