Intel Corporation
Metal filament memory cells
Last updated:
Abstract:
Disclosed herein are metal filament memory cells, and related devices and techniques. In some embodiments, a memory cell may include: a transistor having a source/drain region; and a metal filament memory device including an active metal and an electrolyte; wherein the electrolyte is coupled between the active metal and the source/drain region when the transistor is an n-type metal oxide semiconductor (NMOS) transistor, and the active metal is coupled between the electrolyte and the source/drain region when the transistor is a p-type metal oxide semiconductor (PMOS) transistor.
Status:
Grant
Type:
Utility
Filling date:
25 Sep 2016
Issue date:
30 Aug 2022