Intel Corporation
Techniques for an inductor at a second level interface
Last updated:
Abstract:
Techniques are provided for an inductor at a second level interface between a first substrate and a second substrate. In an example, the inductor can include a winding and a core disposed inside the winding. The winding can include first conductive traces of a first substrate, second conductive traces of a second non-semiconductor substrate, and a plurality of connectors configured to connect the first substrate with the second substrate. Each connector of the plurality of connectors can be located between a trace of the first conductive traces and a corresponding trace of the second conductive traces.
Status:
Grant
Type:
Utility
Filling date:
11 Aug 2020
Issue date:
8 Jun 2021