Intel Corporation
Phase change memory structures

Last updated:

Abstract:

A phase change memory structure (100) includes a phase change material layer (110), a top electrode layer (120) above the phase change material layer, a metal silicon nitride layer (130) in contact with the top electrode layer opposite from the phase change material layer, a metal silicide layer (140) in contact with the metal silicon nitride layer opposite from the top electrode layer, and a conductive metal bit line (150) in contact with the metal silicide layer opposite from the metal silicon nitride layer.

Status:
Grant
Type:

Utility

Filling date:

1 Jul 2017

Issue date:

25 May 2021