Intel Corporation
Phase change memory structures
Last updated:
Abstract:
A phase change memory structure (100) includes a phase change material layer (110), a top electrode layer (120) above the phase change material layer, a metal silicon nitride layer (130) in contact with the top electrode layer opposite from the phase change material layer, a metal silicide layer (140) in contact with the metal silicon nitride layer opposite from the top electrode layer, and a conductive metal bit line (150) in contact with the metal silicide layer opposite from the metal silicon nitride layer.
Status:
Grant
Type:
Utility
Filling date:
1 Jul 2017
Issue date:
25 May 2021