Intel Corporation
SEMICONDUCTOR PACKAGING WITH HIGH DENSITY INTERCONNECTS

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Abstract:

Various embodiments disclosed relate to a semiconductor package. The present semiconductor package includes a substrate. The substrate is formed from alternating conducting layers and dielectric layers. A first active electronic component is disposed on an external surface of the substrate, and a second active electronic component is at least partially embedded within the substrate. A first interconnect region is formed from a plurality of interconnects between the first active electronic component and the second active electronic component. Between the first active electronic component and the substrate a second interconnect region is formed from a plurality of interconnects. Additionally, a third interconnect region is formed from a plurality of interconnects between the second active electronic component and the substrate.

Status:
Application
Type:

Utility

Filling date:

4 Mar 2021

Issue date:

24 Jun 2021