Intel Corporation
DIE INTERCONNECT STRUCTURES AND METHODS
Last updated:
Abstract:
Generally discussed herein are systems, devices, and methods to reduce crosstalk interference. An interconnect structure can include a first metal layer, a second metal layer, a third metal layer, the first metal layer closer to the first and second dies than the second and third metal layers, the first metal layer including a ground plane within a footprint of a bump field of the interconnect structure and signal traces outside the footprint of the bump field.
Status:
Application
Type:
Utility
Filling date:
8 Dec 2020
Issue date:
3 Jun 2021