Intel Corporation
DIE INTERCONNECT STRUCTURES AND METHODS

Last updated:

Abstract:

Generally discussed herein are systems, devices, and methods to reduce crosstalk interference. An interconnect structure can include a first metal layer, a second metal layer, a third metal layer, the first metal layer closer to the first and second dies than the second and third metal layers, the first metal layer including a ground plane within a footprint of a bump field of the interconnect structure and signal traces outside the footprint of the bump field.

Status:
Application
Type:

Utility

Filling date:

8 Dec 2020

Issue date:

3 Jun 2021