Littelfuse, Inc.
Trench IGBT with waved floating P-well electron injection

Last updated:

Abstract:

A trench IGBT includes a floating P well and a floating N+ well that extends down into the floating P well. A bottom surface of the floating P well has a novel waved contour so that it has thinner portions and thicker portions. When the IGBT is on, electrons flow from an N+ emitter, vertically through a channel along a trench sidewall, and to an N- type drift layer. Additional electrons flow through the channel but then pass under the trench, through the floating P well to the floating N+ well, and laterally through the floating N+ well. NPN transistors are located at thinner portions of the floating P type well. The NPN transistors inject electrons from the floating N+ type well down into the N- drift layer. The extra electron injection reduces V.sub.CE(SAT). The waved contour can be made without adding any masking step to an IGBT manufacturing process.

Status:
Grant
Type:

Utility

Filling date:

28 Aug 2017

Issue date:

15 Oct 2019