LG Display Co., Ltd.
Thin film transistor and method for manufacturing the same, and display device including the same

Last updated:

Abstract:

A thin film transistor and a method for manufacturing the same, and a display device including the same are disclosed, in which a P type semiconductor characteristic is realized using an active layer that includes a Sn based oxide. The thin film transistor comprises an active layer that includes an Sn(II)O based oxide; a metal oxide layer being in contact with one surface of the active layer; a gate electrode overlapped with the active layer; a gate insulating film provided between the gate electrode and the active layer; a source electrode being in contact with a first side of the active layer; and a drain electrode being in contact with a second side of the active layer.

Status:
Grant
Type:

Utility

Filling date:

4 Sep 2020

Issue date:

15 Jun 2021