ArcelorMittal S.A.
VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE
Last updated:
Abstract:
A method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a vacuum deposition facility.
Status:
Application
Type:
Utility
Filling date:
23 Apr 2019
Issue date:
5 Aug 2021