Materion Corporation
Cobalt, iron, boron, and/or nickel alloy-containing articles and methods for making same
Last updated:
Abstract:
Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X=B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.
Status:
Grant
Type:
Utility
Filling date:
25 Jan 2019
Issue date:
24 Aug 2021