Materion Corporation
Cobalt, iron, boron, and/or nickel alloy-containing articles and methods for making same

Last updated:

Abstract:

Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X=B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.

Status:
Grant
Type:

Utility

Filling date:

25 Jan 2019

Issue date:

24 Aug 2021