Micron Technology, Inc.
MASK PATTERNS GENERATED IN MEMORY FROM SEED VECTORS
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Abstract:
The present disclosure includes apparatuses and methods related to mask patterns generated in memory from seed vectors. An example method includes performing operations on a plurality of data units of a seed vector and generating, by performance of the operations, a vector element in a mask pattern.
Status:
Application
Type:
Utility
Filling date:
12 Apr 2021
Issue date:
29 Jul 2021