Micron Technology, Inc.
MASK PATTERNS GENERATED IN MEMORY FROM SEED VECTORS

Last updated:

Abstract:

The present disclosure includes apparatuses and methods related to mask patterns generated in memory from seed vectors. An example method includes performing operations on a plurality of data units of a seed vector and generating, by performance of the operations, a vector element in a mask pattern.

Status:
Application
Type:

Utility

Filling date:

12 Apr 2021

Issue date:

29 Jul 2021