Micron Technology, Inc.
Trench walls, conductive structures having different widths and methods of making same
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Abstract:
Embodiments of the disclosure are drawn to apparatuses and methods for trench walls including widened portions and/or conductive structures including constricted portions. The trench walls may include multiple widened portions spaced apart along a length of the trench wall in some examples. Similarly, in some examples, the conductive structures may include multiple constricted portions spaced apart along a length of the conductive structure. In some examples, the dimensions of the widened portions and/or the spacing between the widened portions may be based on properties of the trench wall.
Status:
Grant
Type:
Utility
Filling date:
24 Sep 2019
Issue date:
14 Sep 2021