Micron Technology, Inc.
SYSTEMS FOR THERMALLY TREATING CONDUCTIVE ELEMENTS ON SEMICONDUCTOR AND WAFER STRUCTURES

Last updated:

Abstract:

Methods of reflowing electrically conductive elements on a wafer may involve directing a laser beam toward a region of a surface of a wafer supported on a film of a film frame to reflow at least one electrically conductive element on the surface of the wafer. In some embodiments, the wafer may be detached from a carrier substrate and be secured to the film frame before laser reflow. Apparatus for performing the methods, and methods of repairing previously reflowed conductive elements on a wafer are also disclosed.

Status:
Application
Type:

Utility

Filling date:

8 Jul 2021

Issue date:

28 Oct 2021