Micron Technology, Inc.
Semiconductor structures including liners comprising alucone and related methods

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Abstract:

A semiconductor device including stacked structures. The stacked structures include at least two chalcogenide materials or alternating dielectric materials and conductive materials. A liner including alucone is formed on sidewalls of the stacked structures. Methods of forming the semiconductor device are also disclosed.

Status:
Grant
Type:

Utility

Filling date:

20 Jun 2019

Issue date:

11 Jan 2022