Micron Technology, Inc.
Arrays Of Capacitors, Methods Used In Forming Integrated Circuitry, And Methods Used In Forming An Array Of Capacitors
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Abstract:
A method used in forming integrated circuitry comprises forming an array of structures elevationally through a stack comprising first and second materials. The structures project vertically relative to an outermost portion of the first material. Energy is directed onto vertically-projecting portions of the structures and onto the second material in a direction that is angled from vertical and that is along a straight line between immediately-adjacent of the structures to form openings into the second material that are individually between the immediately-adjacent structures along the straight line. Other embodiments, including structure independent of method, are disclosed.
Status:
Application
Type:
Utility
Filling date:
2 Nov 2021
Issue date:
24 Feb 2022