Micron Technology, Inc.
Microelectronic devices and memory devices

Abstract:

A microelectronic device comprises a stack structure having tiers each including a conductive structure and an insulating structure, the stack structure comprises a staircase region comprising staircase structures, a select gate contact region, and a memory array region between the staircase region and the select gate contact region; contact structures on steps of the staircase structures; string drivers coupled to the contact structures and comprising transistors underlying and within horizontal boundaries of the staircase region; a triple well structure underlying the memory array region; a select gate structure between the stack structure and the triple well structure; semiconductive pillar structures within horizontal boundaries of the memory array region and extending through the stack structure and the select gate structure to the triple well structure; and a select gate contact structure within horizontal boundaries of the select gate contact region and extending through the stack structure to the select gate structure.