Micron Technology, Inc.
Biased sampling methodology for wear leveling
Last updated:
Abstract:
A system includes a memory device and a processing device, coupled to the memory device. The processing device is to sample a first subset of data units from a set of data units of the memory device using a biased sampling process that increases a probability of sampling particular data units from the set of data units based on one or more characteristics associated with the particular data units. The processing device is to identify a first candidate data unit from the first subset of data units and perform a wear leveling operation in view of the first candidate data unit.
Status:
Grant
Type:
Utility
Filling date:
6 Jul 2020
Issue date:
24 May 2022