Micron Technology, Inc.
Methods of forming microelectronic devices
Last updated:
Abstract:
A method of forming a microelectronic device comprises forming a source material around substantially an entire periphery of a base material, and removing the source material from lateral sides of the base material while maintaining the source material over an upper surface and a lower surface of the base material. Related methods and base structures for microelectronic devices are also described.
Status:
Grant
Type:
Utility
Filling date:
18 Jun 2020
Issue date:
5 Jul 2022