Micron Technology, Inc.
Methods of forming microelectronic devices

Last updated:

Abstract:

A method of forming a microelectronic device comprises forming a source material around substantially an entire periphery of a base material, and removing the source material from lateral sides of the base material while maintaining the source material over an upper surface and a lower surface of the base material. Related methods and base structures for microelectronic devices are also described.

Status:
Grant
Type:

Utility

Filling date:

18 Jun 2020

Issue date:

5 Jul 2022