Micron Technology, Inc.
Semiconductor structures, memory cells and devices comprising ferroelectric materials, systems including same, and related methods
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Abstract:
A semiconductor structure includes an electrode, a ferroelectric material adjacent the electrode, the ferroelectric material comprising an oxide of at least one of hafnium and zirconium, the ferroelectric material doped with bismuth, and another electrode adjacent the ferroelectric material on an opposite side thereof from the first electrode. Related semiconductor structures, memory cells, semiconductor devices, electronic systems, and related methods are disclosed.
Status:
Grant
Type:
Utility
Filling date:
15 Jul 2020
Issue date:
26 Jul 2022