Micron Technology, Inc.
Methods of forming resistive memory elements
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Abstract:
A resistive memory element comprises a first electrode, an active material over the first electrode, a buffer material over the active material and comprising longitudinally extending, columnar grains of crystalline material, an ion reservoir material over the buffer material, and a second electrode over the ion reservoir material. A memory cell, a memory device, an electronic system, and a method of forming a resistive memory element are also described.
Status:
Grant
Type:
Utility
Filling date:
27 Aug 2019
Issue date:
27 Apr 2021