Micron Technology, Inc.
FREEZING A SACRIFICIAL MATERIAL IN FORMING A SEMICONDUCTOR
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Abstract:
The present disclosure includes apparatuses and methods related to freezing a sacrificial material in forming a semiconductor. In an example, a method may include solidifying, via freezing, a sacrificial material in an opening of a structure, wherein the sacrificial material has a freezing point below a boiling point of a solvent used in a wet clean operation and removing the sacrificial material via sublimation by exposing the sacrificial material to a particular temperature range.
Status:
Application
Type:
Utility
Filling date:
19 Mar 2021
Issue date:
22 Jul 2021