Micron Technology, Inc.
FREEZING A SACRIFICIAL MATERIAL IN FORMING A SEMICONDUCTOR

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Abstract:

The present disclosure includes apparatuses and methods related to freezing a sacrificial material in forming a semiconductor. In an example, a method may include solidifying, via freezing, a sacrificial material in an opening of a structure, wherein the sacrificial material has a freezing point below a boiling point of a solvent used in a wet clean operation and removing the sacrificial material via sublimation by exposing the sacrificial material to a particular temperature range.

Status:
Application
Type:

Utility

Filling date:

19 Mar 2021

Issue date:

22 Jul 2021